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PDF) Study of the NF3 plasma cleaning of reactors for amorphous silicon  deposition | Giovanni Bruno - Academia.edu
PDF) Study of the NF3 plasma cleaning of reactors for amorphous silicon deposition | Giovanni Bruno - Academia.edu

Fabrication of reproducible sub-5 nm nanogaps by a focused ion beam and  observation of Fowler-Nordheim tunneling
Fabrication of reproducible sub-5 nm nanogaps by a focused ion beam and observation of Fowler-Nordheim tunneling

Growth and characterization of germanium epitaxial film on silicon (001)  with germane precursor in metal organic chemical vapour deposition (MOCVD)  chamber – topic of research paper in Materials engineering. Download  scholarly article
Growth and characterization of germanium epitaxial film on silicon (001) with germane precursor in metal organic chemical vapour deposition (MOCVD) chamber – topic of research paper in Materials engineering. Download scholarly article

Atomic relocation processes in impurity-free disordered p -GaAs epilayers  studied by deep level transient spectroscopy
Atomic relocation processes in impurity-free disordered p -GaAs epilayers studied by deep level transient spectroscopy

Properties of Mn- and Co-doped bulk ZnO crystals
Properties of Mn- and Co-doped bulk ZnO crystals

PDF) Analytical transmission electron microscopy observations on the  stability of TiCN in electrically conductive α-β SiAlON/TiCN composites |  Hilmi Yurdakul - Academia.edu
PDF) Analytical transmission electron microscopy observations on the stability of TiCN in electrically conductive α-β SiAlON/TiCN composites | Hilmi Yurdakul - Academia.edu

Ex situ Lift Out of PFIB Prepared TEM Specimens | Microscopy and  Microanalysis | Cambridge Core
Ex situ Lift Out of PFIB Prepared TEM Specimens | Microscopy and Microanalysis | Cambridge Core

PDF) Roller nanoimprint lithography. J Vac Sci Technol B
PDF) Roller nanoimprint lithography. J Vac Sci Technol B

Fabrication of nanodamascene metallic single electron transistors with  atomic layer deposition of tunnel barrier
Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier

Production of focused, lowenergy, hydrogenion beams using a Colutron ion  source
Production of focused, lowenergy, hydrogenion beams using a Colutron ion source

Morphologic and electronic changes induced by thermally supported hydrogen  cleaning of GaAs (110) facets
Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs (110) facets

Journal of Vacuum Science and Technology B
Journal of Vacuum Science and Technology B

EUV Maskless Lithography J. Vac. Sci. Technol. B 30, (2012); 9/25/20121K.  Johnson - ppt download
EUV Maskless Lithography J. Vac. Sci. Technol. B 30, (2012); 9/25/20121K. Johnson - ppt download

PDF) Suppression of the base-collector leakage current in integrated  Si/SiGe heterojunction bipolar transistors
PDF) Suppression of the base-collector leakage current in integrated Si/SiGe heterojunction bipolar transistors

PDF) Monte Carlo calculations of the beam flux distribution from  molecular-beam epitaxy sources
PDF) Monte Carlo calculations of the beam flux distribution from molecular-beam epitaxy sources

PDF) Synthesis of TiN/N-doped TiO 2 composite films as visible light active  photocatalyst Synthesis of TiN/N-doped TiO 2 composite films as visible  light active photocatalyst
PDF) Synthesis of TiN/N-doped TiO 2 composite films as visible light active photocatalyst Synthesis of TiN/N-doped TiO 2 composite films as visible light active photocatalyst

Reduction of exposing time in massively-parallel E-beam systems
Reduction of exposing time in massively-parallel E-beam systems

Cu film thermal stability on plasma cleaned polycrystalline Ru
Cu film thermal stability on plasma cleaned polycrystalline Ru

Nouvelles technologies plasma
Nouvelles technologies plasma

Nanoscale control of energy and matter in plasma–surface interactions:  Toward energy- and matter-efficient nanotecha)
Nanoscale control of energy and matter in plasma–surface interactions: Toward energy- and matter-efficient nanotecha)

PDF] Direct detection and imaging of low-energy electrons witk delta-doped  charge-coupled devices | Semantic Scholar
PDF] Direct detection and imaging of low-energy electrons witk delta-doped charge-coupled devices | Semantic Scholar

Solved 1,0 Helium ion exposure 0.8 3. (25 pts) The right | Chegg.com
Solved 1,0 Helium ion exposure 0.8 3. (25 pts) The right | Chegg.com

HSQ - Nanolithography
HSQ - Nanolithography

Layer-by-layer nanometer scale etching of two-dimensional substrates using  the scanning tunneling microscope | Journal of the American Chemical Society
Layer-by-layer nanometer scale etching of two-dimensional substrates using the scanning tunneling microscope | Journal of the American Chemical Society

Practical approach to modeling e-beam lithographic process from SEM images  for minimization of line edge roughness and critical
Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical

Gate-controlled ZnO nanowires for field-emission device application
Gate-controlled ZnO nanowires for field-emission device application