Annuel pendre À léchelle nationale j vac sci technol b répertoire Conflit gang
PDF) Study of the NF3 plasma cleaning of reactors for amorphous silicon deposition | Giovanni Bruno - Academia.edu
Fabrication of reproducible sub-5 nm nanogaps by a focused ion beam and observation of Fowler-Nordheim tunneling
Growth and characterization of germanium epitaxial film on silicon (001) with germane precursor in metal organic chemical vapour deposition (MOCVD) chamber – topic of research paper in Materials engineering. Download scholarly article
Atomic relocation processes in impurity-free disordered p -GaAs epilayers studied by deep level transient spectroscopy
Properties of Mn- and Co-doped bulk ZnO crystals
PDF) Analytical transmission electron microscopy observations on the stability of TiCN in electrically conductive α-β SiAlON/TiCN composites | Hilmi Yurdakul - Academia.edu
Ex situ Lift Out of PFIB Prepared TEM Specimens | Microscopy and Microanalysis | Cambridge Core
PDF) Roller nanoimprint lithography. J Vac Sci Technol B
Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
Production of focused, lowenergy, hydrogenion beams using a Colutron ion source
Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs (110) facets
Journal of Vacuum Science and Technology B
EUV Maskless Lithography J. Vac. Sci. Technol. B 30, (2012); 9/25/20121K. Johnson - ppt download
PDF) Suppression of the base-collector leakage current in integrated Si/SiGe heterojunction bipolar transistors
PDF) Monte Carlo calculations of the beam flux distribution from molecular-beam epitaxy sources
PDF) Synthesis of TiN/N-doped TiO 2 composite films as visible light active photocatalyst Synthesis of TiN/N-doped TiO 2 composite films as visible light active photocatalyst
Reduction of exposing time in massively-parallel E-beam systems
Cu film thermal stability on plasma cleaned polycrystalline Ru
Nouvelles technologies plasma
Nanoscale control of energy and matter in plasma–surface interactions: Toward energy- and matter-efficient nanotecha)
PDF] Direct detection and imaging of low-energy electrons witk delta-doped charge-coupled devices | Semantic Scholar
Solved 1,0 Helium ion exposure 0.8 3. (25 pts) The right | Chegg.com
HSQ - Nanolithography
Layer-by-layer nanometer scale etching of two-dimensional substrates using the scanning tunneling microscope | Journal of the American Chemical Society
Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical
Gate-controlled ZnO nanowires for field-emission device application